Formation of self-assembled monolayers of alkylphosphonic acid on the native oxide surface of SS316L

Langmuir

Volumn 22, Issue 15, 2006, Pages 6469-6472

  Raman, Aparna ^a   Dubey, Manish ^b   Gouzman, Irina ^b,c   Gawalt, Ellen S ^a  

^a DUQUESNE UNIVERSITY   (United States)

^b PRINCETON UNIVERSITY   (United States)

^c SOREQ NUCLEAR RESEARCH CENTER   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYLPHOSPHONIC ACID; METAL OXIDE SUBSTRATES; PHOSPHONATE MONOLAYERS; SS316L;

ATOMIC FORCE MICROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); ORGANIC ACIDS; PHOSPHATES; SELF ASSEMBLY; STEEL; X RAY PHOTOELECTRON SPECTROSCOPY;

MONOLAYERS;

OXIDE; PHOSPHONIC ACID DERIVATIVE; STAINLESS STEEL;

ARTICLE; ARTIFICIAL MEMBRANE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; SURFACE PROPERTY; SYNTHESIS;

MEMBRANES, ARTIFICIAL; MICROSCOPY, ATOMIC FORCE; OXIDES; PHOSPHONIC ACIDS; STAINLESS STEEL; SURFACE PROPERTIES;

EID: 33746619132     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la060636p     Document Type: Article

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