Formation and stability of organophosphonic acid monolayers on ZnAl alloy coatings

Surface and Coatings Technology

Volumn 204, Issue 21-22, 2010, Pages 3578-3584

  Thissen, Peter ^a,b   Wielant, Jan ^c   Köyer, Maria ^d   Toews, Sergej ^b   Grundmeier, Guido ^a,b  

^a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

^b UNIVERSITY OF PADERBORN   (Germany)

^c VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

^d Dortmunder Oberflachencentrum GmbH   (Germany)

Author keywords

Adhesion promoter; Phosphonic acid; PM IRRAS; SEM; XPS; ZnAl alloy

Indexed keywords

ADHESION PROMOTER; PHOSPHONIC ACIDS; PM-IRRAS; SEM; XPS; ZNAL ALLOY;

ADHESION; ADSORPTION; ALLOYS; ALUMINUM; CERIUM ALLOYS; CONTACT ANGLE; CORROSION INHIBITORS; DISSOLUTION; INFRARED SPECTROSCOPY; ORGANIC ACIDS; OXIDE FILMS; PRECIPITATION (CHEMICAL); SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SELF ASSEMBLED MONOLAYERS; TEMPORARY COATINGS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC;

ABSORPTION SPECTROSCOPY;

EID: 77953716354     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.04.027     Document Type: Article

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