Measuring the roughness of buried interfaces by sputter depth profiling

Nanotechnology

Volumn 24, Issue 1, 2013, Pages

  Baryshev, S V ^a   Klug, J A ^a   Zinovev, A V ^a   Tripa, C E ^a   Peng, Q ^a   Elam, J W ^a,b   Veryovkin, I V ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b Duke University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALD GROWTH; BURIED INTERFACE; DEPTH PROFILE; DUAL BEAM; HIGH RESOLUTION; INTERFACIAL ROUGHNESS; MGO; MODEL YIELDS; NANO LAYERS; SECONDARY ION MASS SPECTROMETERS; SPECULAR X-RAY REFLECTIVITIES; SPUTTER-DEPTH PROFILING; TIME OF FLIGHT;

INFORMATION THEORY;

ATOMIC LAYER DEPOSITION;

EID: 84870980303     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/24/1/015708     Document Type: Article

References (33)

1. Hopkins P, Duda J, Petz C and Floro J 2011 Phys. Rev. B 84 035438
2. Mtsuko D, Avnon A, Lievonen J, Ahlskog M and Menon R 2008 Nanotechnology 19 125304
3. Wang C, Kohn A, Wang S G and Ward R C C 2011 J. Phys.: Condens. Matter 23 116001
4. Dash S, Sharma S, Le Breton J, Peiro J, Jaffrès H, George J M, Lemaître A and Jansen R 2011 Phys. Rev. B 84 054410
5. Bakonyi I and Péter L 2010 Prog. Mater. Sci. 55 107
6. de Pauli M, Malachias A, Westfahl H, Bettini J, Ramirez A, Huang G S, Mei Y F and Schmidt O G 2011 J. Appl. Phys. 109 063524
7. Biswas A and Bhattacharyya D 2011 J. Appl. Phys. 109 084311
8. Jeong H Y, Kim Y I, Lee J Y and Choi S-Y 2010 Nanotechnology 21 115203
9. Valkovskiy G A, Baidakova M V, Brunkov P N, Konnikov S G, Yagovkina M A and Zadiranov J M 2011 Phys. Status Solidi a 208 2623
10. Jensen J M, Oelkers A B, Toivola R, Johnson D C, Elam J W and George S M 2002 Chem. Mater. 14 2276
11. Baena J D, Jelinek L and Marqués R 2005 New J. Phys. 7 166
12. Monsoriu J A, Depine R A, Martínez-Ricci M L, Silvestre E and Andrés P 2009 Opt. Lett. 34 3172
13. Chiba D, Akiba N, Matsukura F, Ohno Y and Ohno H 2000 Appl. Phys. Lett. 77 1873
14. Zhong X Y, Kabius B, Schreiber D K, Eastman J A, Fong D D and Petford-Long A K 2012 Appl. Phys. Lett. 100 101604
15. Lee D-J, Kim H-M, Kwon J-Y, Choi H, Kim S-H and Kim K-B 2011 Adv. Funct. Mater. 21 448
16. McKeegan K D, Kallio A P A, Heber V S, Jarzebinski G, Mao P H, Coath C D, Kunihiro T, Wiens R C, Nordholt J E, Moses R W, Reisenfeld D B, Jurewicz A J G and Burnett D S 2011 Science 332 1528
17. Mrksich M 2008 ACS Nano 2 7
18. Vickerman J C and Gilmore I S 2009 Surface Analysis: The Principal Techniques (Chichester: Wiley)
19. Putkonen M, Sajavaara T and Niinistö L 2000 J. Mater. Chem. 10 1857
20. Lujala V, Skarp J, Tammenmaa M and Suntola T 1994 Appl. Surf. Sci. 82/83 34
21. Elam J W, Sechrist Z A and George S M 2002 Thin Solid Films 414 43
22. Veryovkin I V, Tripa C E and Pellin M J 2008 Phys. Proc. 1 379
23. Iltgen K, Bendel C, Benninghoven A and Niehuis E 1997 J. Vac. Sci. Technol. A 15 460
24. Ormsby T J, Chu D P, Dowsett M G, Cooke G A and Patel S B 1999 Appl. Surf. Sci. 144/145 292
25. AFM measurements of bottoms of sputtered craters under the same conditions described here, to be published
26. Baryshev S V, Zinovev A V, Tripa C E, Erck R A and Veryovkin I V 2012 Appl. Surf. Sci. 258 6963
27. Hofmann S 1992 J. Vac. Sci. Technol. B 10 316
28. Hofmann S 1994 Surf. Interface Anal. 21 673
29. Betz G and Wehner G K 1983 Top. Appl. Phys. 52 11
30. Parratt L 1954 Phys. Rev. 95 359
31. Asikainen T, Ritala M, Leskelä M, Prohaska T, Friedbacher G and Grasserbauer M 1996 Appl. Surf. Sci. 99 91
32. Hofmann S 1998 Rep. Prog. Phys. 61 827
33. Schneider C W, Esposito M, Marozau I, Conder K, Doebeli M, Hu Y, Mallepell M, Wokaun A and Lippert T 2010 Appl. Phys. Lett. 97 192107