The origin of oxygen in oxide thin films: Role of the substrate

Applied Physics Letters

Volumn 97, Issue 19, 2010, Pages

  Schneider, C W ^b   Esposito, M ^b   Marozau, I ^a   Conder, K ^b   Doebeli, M ^b   Hu, Yi ^b   Mallepell, M ^b   Wokaun, A ^b   Lippert, T ^b  

^a UNIVERSITY OF FRIBOURG   (Switzerland)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN MATERIALS; EPITAXIALLY GROWN; FILM TRANSFER; OXIDE THIN FILMS; OXYGEN BALANCE; OXYGEN TRANSFER EFFECTS; SRTIO; THIN-FILM PROPERTIES;

DEPOSITION; DEPTH PROFILING; FILM GROWTH; LANTHANUM ALLOYS; OXIDE FILMS; OXYGEN; PULSED LASER DEPOSITION; SECONDARY ION MASS SPECTROMETRY; STRONTIUM ALLOYS; THIN FILMS; VAPOR DEPOSITION;

SUBSTRATES;

EID: 78249234737     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3515849     Document Type: Article

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