Study of roughness in multilayer Mo-Si mirrors

Physica Status Solidi (A) Applications and Materials Science

Volumn 208, Issue 11, 2011, Pages 2623-2628

  Valkovskiy, G A ^a   Baidakova, M V ^a   Brunkov, P N ^a   Konnikov, S G ^a   Yagovkina, M A ^a   Zadiranov, Ju M ^a  

^a IOFFE INSTITUTE   (Russian Federation)

Author keywords

interfacial roughness; Mo Si mirrors; power spectral density function; SAXS; XRR

Indexed keywords

AFM; INTERFACIAL ROUGHNESS; INTERNAL INTERFACES; LATERAL CORRELATION LENGTH; LOW FREQUENCY; ROOT MEAN SQUARE ROUGHNESS; ROUGHNESS PARAMETERS; SAXS; SMALL ANGLE X-RAY SCATTERING; TECHNOLOGICAL CONDITIONS; TRANSITION LAYERS; TWO LAYERS; X-RAY REFLECTOMETRY; XRR;

COMPUTER SIMULATION; MOLYBDENUM; MULTILAYERS; POWER SPECTRAL DENSITY; SPECTRAL DENSITY; SUBSTRATES; SURFACE ROUGHNESS; X RAY SCATTERING;

MIRRORS;

EID: 80155205475     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201184274     Document Type: Article

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