Ion energy distributions in inductively coupled plasmas having a biased boundary electrode

Plasma Sources Science and Technology

Volumn 21, Issue 6, 2012, Pages

  Logue, Michael D ^a   Shin, Hyungjoo ^b   Zhu, Weiye ^b   Xu, Lin ^b   Donnelly, Vincent M ^b   Economou, Demetre J ^b   Kushner, Mark J ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIONAL FLEXIBILITIES; APPLIED BIAS; BOUNDARY ELECTRODES; BULK PLASMA PROPERTIES; COMPUTATIONAL INVESTIGATION; ENERGY OF IONS; ENERGY PEAKS; EXPERIMENTAL MEASUREMENTS; GROUNDED SUBSTRATES; ION ENERGY DISTRIBUTIONS; PLASMA MATERIALS-PROCESSING APPLICATIONS; PLASMA POTENTIAL; PLASMA PROPERTIES; PULSE POWER; PULSED DC; PULSED PLASMA; SURFACE PROCESS; THRESHOLD ENERGY; TIME-AVERAGED;

ION BOMBARDMENT; PLASMA DEVICES; PLASMA ETCHING;

INDUCTIVELY COUPLED PLASMA;

EID: 84870370980     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/21/6/065009     Document Type: Article

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