Fabrication of Au nanorod and nanogap split-ring structures by reactive-monolayer-assisted thermal nanoimprint lithography involving electrodeposition

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 30, Issue 6, 2012, Pages

  Tomioka, Tatsuya ^a   Kubo, Shoichi ^a   Nagase, Koichi ^a   Hoga, Morihisa ^b   Nakagawa, Masaru ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC ABSORPTION; AU BUMP; AU ELECTRODES; AU NANORODS; INCIDENT LIGHT; ION MILLING; LINEARLY POLARIZED; LONG AXIS; NANO-GAP; PLASMON BAND; SILICA SUBSTRATE; THERMAL NANOIMPRINT LITHOGRAPHY;

ARGON; ELECTRODEPOSITION; MILLING (MACHINING); MONOLAYERS; NANOIMPRINT LITHOGRAPHY; NANORODS; OPTICAL PROPERTIES; SILICA; WET ETCHING;

GOLD;

EID: 84870342426     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.4755817     Document Type: Article

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