Large area pattern replication by nanoimprint lithography for LCD-TFT application

Microelectronic Engineering

Volumn 86, Issue 12, 2009, Pages 2427-2431

  Kim, Jeong Gil ^a   Sim, Youngsuk ^a   Cho, Youngtae ^a   Seo, Jung Woo ^a   Kwon, Sin ^a   Park, Jung Woo ^a   Choi, Hyoung Gil ^a   Kim, Hyuk ^a   Lee, Sukwon ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Gate; Large area; LCD; Nanoimprint; TFT

Indexed keywords

GATE; LARGE AREA; LCD; NANOIMPRINT; TFT;

CHROMIUM; FABRICATION; LIQUID CRYSTAL DISPLAYS; OPTICAL MATERIALS; POLYCHLORINATED BIPHENYLS; RESINS;

NANOIMPRINT LITHOGRAPHY;

EID: 70349769317     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.05.006     Document Type: Article

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