Photochemically grafted polystyrene layer assisting selective au electrodeposition

Langmuir

Volumn 28, Issue 31, 2012, Pages 11646-11653

  Nagase, Koichi ^a   Kubo, Shoichi ^a   Nakagawa, Masaru ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESIVE LAYERS; AU ELECTRODES; GRAFTED POLYSTYRENE; LOW CURRENT DENSITY; RESIST LAYERS; RESIST MATERIALS; RESIST PATTERN; SELECTIVE ELECTRODEPOSITION; SILICA SUBSTRATE; SUBMICROMETERS; THERMAL NANOIMPRINT LITHOGRAPHY; ULTRAVIOLET LIGHTS; UNIMODAL; WEIGHT-AVERAGE MOLECULAR WEIGHT;

CHROMIUM; ELECTRODEPOSITION; GRAFTING (CHEMICAL); MOLECULAR WEIGHT; MONOLAYERS; NANOIMPRINT LITHOGRAPHY; PHOTOREACTIVITY; PHOTORESISTS; POLYSTYRENES; SILICA; SUBSTRATES; WET ETCHING;

GOLD;

EID: 84864723227     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la301632y     Document Type: Article

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