Improvement of the dose uniformity in plasma immersed ion implantation by introducing a vertical biased ring

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 571-574

  Stamate, E ^a   Holtzer, N ^a   Sugai, H ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Focusing effect; Impact angle; Plasma immersed ion implantation; Sheath structure

Indexed keywords

COMPUTER SIMULATION; PLASMAS; VISUALIZATION;

FOCUSING EFFECT; IMPACT ANGLE; PLASMA IMMERSED ION IMPLANTATION; SHEATH STRUCTURE;

ION IMPLANTATION;

EID: 33645282768     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.055     Document Type: Article

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