Monolithic integrations of slanted silicon nanostructures on 3D microstructures and their application to surface-enhanced raman spectroscopy

Journal of Physical Chemistry C

Volumn 116, Issue 45, 2012, Pages 24161-24170

  Xu, Zhida ^a   Jiang, Jing ^a   Gartia, Manas Ranjan ^a,b   Liu, Gang Logan ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

3D MICROSTRUCTURES; BLACK SILICON; GRADUAL CHANGES; HIGH-THROUGHPUT; INCIDENT ANGLES; INTEGRATION METHOD; MESOSCALE; MESOSCALE STRUCTURE; MICRO-PYRAMID ARRAYS; MONOLITHIC INTEGRATION; NANO-CONES; NANOCONE; NANOCONE ARRAYS; NEW DIMENSIONS; NON-PLANAR SURFACES; PLASMA ETCHING PROCESS; POLARIZED EXCITATION; PYRAMIDAL PITS; SERS SUBSTRATE; SILICON NANOSTRUCTURES; SILICON SURFACES; SURFACE ENHANCED RAMAN SCATTERING (SERS); SURFACE ENHANCED RAMAN SPECTROSCOPY;

ATOMIC FORCE MICROSCOPY; FABRICATION; MONOLITHIC INTEGRATED CIRCUITS; NANOPHOTONICS; OPTIMIZATION; PLASMA ETCHING; PRECIOUS METALS; RAMAN SPECTROSCOPY; SILICON; SUBSTRATES; SURFACE SCATTERING; THREE DIMENSIONAL COMPUTER GRAPHICS;

NANOSTRUCTURES;

EID: 84869416083     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp308162c     Document Type: Article

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