Lithography-free sub-100 nm nanocone array antireflection layer for low-cost silicon solar cell

Applied Optics

Volumn 51, Issue 19, 2012, Pages 4430-4435

  Xu, Zhida ^a   Jiang, Jing ^a   Liu, Gang Logan ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; NANOSTRUCTURES; SILICON; SILICON OXIDES; SOLAR CELLS; THROUGHPUT;

ANTI-REFLECTION LAYERS; FOREST STRUCTURE; NANO-MANUFACTURING; NANO-MANUFACTURING TECHNOLOGY; NANOCONE ARRAYS; OPTICAL REFLECTION; OXIDIZED SILICON; PHOTOVOLTAIC DEVICES;

SILICON SOLAR CELLS;

EID: 84863761088     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.51.004430     Document Type: Article

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