Effects of substrate bias voltage on the microstructure, mechanical properties and tribological behavior of reactive sputtered niobium carbide films

Surface and Coatings Technology

Volumn 212, Issue , 2012, Pages 185-191

  Zhang, Kan ^a   Wen, M ^a   Meng, Q N ^a   Hu, C Q ^a   Li, X ^a   Liu, C ^a   Zheng, W T ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

Films; Friction; Hardness; Magnetron sputtering; Niobium carbide; Wear

Indexed keywords

ABSOLUTE VALUES; BOMBARDING ENERGIES; CARBON SPECIES; DIRECT CURRENT; FRICTION COEFFICIENTS; HIGH STRESS; INTERSTITIAL POSITIONS; METHANE FLOW; NIOBIUM CARBIDE; REACTIVE MAGNETRON SPUTTERING; SI (100) SUBSTRATE; SUBSTRATE BIAS VOLTAGES; TRIBOLOGICAL BEHAVIORS;

AMORPHOUS CARBON; BIAS VOLTAGE; DEPOSITS; FILMS; FRICTION; HARDNESS; ION BOMBARDMENT; MAGNETRON SPUTTERING; METHANATION; NIOBIUM; SUBSTRATES; TRIBOLOGY; WEAR OF MATERIALS;

CARBIDES;

EID: 84869228290     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.09.046     Document Type: Article

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