Surface plasmon interference lithography with a surface relief metal grating

Optics Communications

Volumn 288, Issue , 2013, Pages 122-126

  Dong, Jianjie ^a   Liu, Juan ^a   Liu, Peng ^a   Liu, Jing ^a   Zhao, Xingxing ^a   Kang, Guoguo ^a   Xie, Jinghui ^a   Wang, Yongtian ^a  

^a BEIJING INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Nanolithography; Subwavelength imaging; Surface plasmons

Indexed keywords

FEATURE SIZES; GRATING PARAMETER; GROOVE WIDTH; INTERFERENCE LITHOGRAPHY; INTERFERENCE PATTERNS; LIGHT ILLUMINATION; METAL GRATING; MINIMUM FEATURE SIZES; NUMERICAL RESULTS; PHOTORESIST LAYERS; SUBWAVELENGTH IMAGING; SURFACE PLASMON WAVES; SURFACE PLASMONS; SURFACE RELIEFS;

DIFFRACTION GRATINGS; ELECTRIC FIELDS; ELECTRON EMISSION; FINITE ELEMENT METHOD; INTEGER PROGRAMMING; NANOLITHOGRAPHY; PHOTORESISTS;

PLASMONS;

EID: 84869094665     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2012.09.072     Document Type: Article

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