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Volumn 17, Issue 7, 2008, Pages 2499-2503
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The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling
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Author keywords
Enhancement; Interference lithography; Resolution; Surface plasmon polaritons (SPPs)
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Indexed keywords
ELECTRIC FIELDS;
ELECTRIC NETWORK ANALYSIS;
ELECTROMAGNETIC FIELD THEORY;
ELECTROMAGNETIC FIELDS;
FINITE DIFFERENCE METHOD;
LITHOGRAPHY;
METALLIZING;
METALS;
NUMERICAL ANALYSIS;
PLASMONS;
PRISMS;
SURFACE PLASMON RESONANCE;
TIME DOMAIN ANALYSIS;
ATTENUATED TOTAL REFLECTION;
COUPLING MODES;
CRITICAL PARAMETERS;
ENHANCEMENT;
EXPOSURE TIME;
FINITE DIFFERENCE TIME DOMAINS;
HIGH INTENSITY;
INTERFERENCE LITHOGRAPHY;
MASKLESS;
METAL FILMS;
PRISM COUPLINGS;
RESOLUTION;
RESONANCE CONDITIONS;
SIMULATION BASED;
SUBWAVELENGTH SCALE;
SURFACE PLASMON;
SURFACE PLASMON POLARITONS;
SURFACE PLASMON POLARITONS (SPPS);
THEORETICAL ANALYSIS;
SURFACE ANALYSIS;
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EID: 49749094722
PISSN: 16741056
EISSN: None
Source Type: Journal
DOI: 10.1088/1674-1056/17/7/025 Document Type: Article |
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Times cited : (23)
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References (14)
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