Nanoscale planar faulting in nanocrystalline Ni-W thin films: Grain growth, segregation, and residual stress

Journal of Materials Research

Volumn 26, Issue 19, 2011, Pages 2558-2573

  Welzel, Udo ^a   Kümmel, Johannes ^b   Bischoff, Ewald ^a   Kurz, Silke ^a   Mittemeijer, Eric Jan ^a,b  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b UNIVERSITY OF STUTTGART   (Germany)

Author keywords

Nanoscale; Thin film; X ray diffraction

Indexed keywords

GRAIN ASPECT RATIOS; GRAIN COARSENING; GROWTH DIRECTIONS; IN-SITU X-RAY DIFFRACTION; NANO SCALE; NANOCRYSTALLINE MICROSTRUCTURES; NANOCRYSTALLINES; TRANSMISSION ELECTRON;

ASPECT RATIO; COARSENING; GRAIN GROWTH; NANOTECHNOLOGY; RESIDUAL STRESSES; STACKING FAULTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

NICKEL;

EID: 84867676024     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/jmr.2011.238     Document Type: Article

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