Suzuki segregation in a binary Cu-Si alloy

Journal of Electron Microscopy

Volumn 53, Issue 4, 2004, Pages 311-323

  Mendis, Budhika G ^a   Jones, Ian P ^a   Smallman, Raymond E ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

Cu Si; FEGTEM EDX; Suzuki segregation

Indexed keywords

ALLOY; COPPER; SILICON;

ALGORITHM; ARTICLE; CHEMISTRY; IMAGE PROCESSING; TRANSMISSION ELECTRON MICROSCOPY;

ALGORITHMS; ALLOYS; COPPER; IMAGE PROCESSING, COMPUTER-ASSISTED; MICROSCOPY, ELECTRON, TRANSMISSION; SILICON;

LATEOLABRAX JAPONICUS;

BINARY ALLOYS; BINDING ENERGY; COPPER ALLOYS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; SILICON ALLOYS;

ANNEALING TEMPERATURES; COHERENT TWIN; CU-SI; FAULT ENERGY; FAULT-PLANES; FEGTEM/EDX; FIELD EMISSION GUN TRANSMISSION ELECTRON MICROSCOPIES; SI ALLOYS; SUZUKI SEGREGATION; TWIN BOUNDARIES;

STACKING FAULTS;

EID: 9944223411     PISSN: 00220744     EISSN: None     Source Type: Journal    
DOI: 10.1093/jmicro/dfh045     Document Type: Article

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