The origin of broad distribution of breakdown times in polycrystalline thin film dielectrics

Applied Physics Letters

Volumn 101, Issue 15, 2012, Pages

  Masuduzzaman, Muhammad ^a   Xie, Sujing ^b   Chung, Jayhoon ^b   Varghese, Dhanoop ^b   Rodriguez, John ^b   Krishnan, Srikanth ^b   Ashraful Alam, Muhammad ^a  

^a PURDUE UNIVERSITY   (United States)

^b TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE AFM; CONSTANT VOLTAGE MODE; FAILURE-TIME DISTRIBUTION; PERCOLATION MODELS; PERCOLATION THEORY; POLYCRYSTALLINE; POLYCRYSTALLINE FILM; POLYCRYSTALLINE OXIDES; POLYCRYSTALLINE THIN FILM; THIN-FILM DIELECTRICS;

ATOMIC FORCE MICROSCOPY; CONDUCTIVE FILMS; DIELECTRIC MATERIALS; GRAIN BOUNDARIES; RELIABILITY THEORY;

PERCOLATION (SOLID STATE);

EID: 84867540715     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4758684     Document Type: Article

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