The evolution of scaling from the homogeneous era to the heterogeneous era

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 2011, Pages

  Bohr, Mark ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUOUS IMPROVEMENTS; DEVICE STRUCTURES; GATE OXIDE; HETEROGENEOUS DEVICES; LOGIC APPLICATIONS; MOSFET SCALING; NEW DEVICES; SIMILAR MATERIAL; TRANSISTOR PERFORMANCE;

ELECTRON DEVICES; SILICON COMPOUNDS; STATIC RANDOM ACCESS STORAGE;

EQUIPMENT;

EID: 84857023274     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.2011.6131469     Document Type: Conference Paper

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