Effect of substrate temperature on structural, morphological and optical properties of crystalline titanium dioxide films prepared by DC reactive magnetron sputtering

Journal of Materials Science: Materials in Electronics

Volumn 23, Issue 10, 2012, Pages 1898-1904

  Ananthakumar, R ^a,b   Subramanian, B ^a,c   Yugeswaran, S ^c   Jayachandran, M ^a  

^a CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

^b Jeju National University   (South Korea)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL COMPOSITIONS; CRYSTALLINE NATURE; CRYSTALLINE TITANIUM DIOXIDE; CRYSTALLIZATION BEHAVIOR; DC REACTIVE MAGNETRON SPUTTERING; DEPOSITION TEMPERATURES; GLASS SUBSTRATES; MORPHOLOGICAL STUDY; OPTICAL BANDS; POLYCRYSTALLINE; STRUCTURAL AND OPTICAL PROPERTIES; SUBSTRATE TEMPERATURE; TETRAGONAL STRUCTURE; TIO; TRANSMITTANCE SPECTRA; VARIOUS SUBSTRATES; VISIBLE LIGHT REGION;

CRYSTALLINE MATERIALS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXIDES; PHOTOELECTRONS; THIN FILMS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

SUBSTRATES;

EID: 84867249005     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-012-0681-1     Document Type: Article

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