Structural, optical and Raman scattering studies on DC magnetron sputtered titanium dioxide thin films

Solar Energy Materials and Solar Cells

Volumn 88, Issue 2, 2005, Pages 199-208

  Karunagaran, B ^a   Kim, Kyunghae ^a   Mangalaraj, D ^a   Yi, Junsin ^a   Velumani, S ^b  

^a Sungkyunkwan University   (South Korea)

^b INSTITUTO MEXICANO DEL PETRÓLEO   (Mexico)

Author keywords

Optical constants; Raman scattering; Reactive sputtering; TiO2 thin films

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; AUGER ELECTRON SPECTROSCOPY; CRYSTALLINE MATERIALS; FREQUENCIES; MAGNETRON SPUTTERING; RAMAN SCATTERING; REFRACTIVE INDEX; TITANIUM DIOXIDE;

OPTICAL CONSTANT; REACTIVE SPUTTERING; TETRAGONAL SYMMETRY; TIO2;

THIN FILMS;

EID: 20144375341     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2004.03.008     Document Type: Article

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