Effect of the substrate temperature on the crystallization of TiO2 films prepared by DC reactive magnetron sputtering

Journal of Crystal Growth

Volumn 300, Issue 2, 2007, Pages 551-554

  Zhang, Yuanyuan ^a   Ma, Xiangyang ^a   Chen, Peiliang ^a   Yang, Deren ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

A1. Anatase; A1. Crystallization; A1. Rutile; A1. Substrate temperature; B1. TiO2 films

Indexed keywords

CRYSTALLIZATION; DEPOSITION; MAGNETRON SPUTTERING; THERMAL EFFECTS; THIN FILMS;

RUTILE; SUBSTRATE TEMPERATURE; TIO2 FILMS;

TITANIUM DIOXIDE;

EID: 33847707761     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.01.008     Document Type: Article

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