Characterization and photocatalytic activity of TiO2 thin films prepared by RF magnetron sputtering

Vacuum

Volumn 85, Issue 1, 2010, Pages 84-88

  Meng, Fanming ^a,b   Lu, Fei ^a  

^a ANHUI UNIVERSITY   (China)

^b DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Anneal; Energy gap; Photocatalytic activity; RF magnetron sputtering; Titania thin film

Indexed keywords

AMBIENT AIR; ANNEALED TEMPERATURE; ANNEALING TEMPERATURES; ATOMIC FORCE MICROSCOPES; CRYSTAL PHASE; FLUORESCENCE SPECTROMETERS; GRAIN SIZE; HIGH-PRESSURE MERCURY LAMP; HOLE PAIRS; LIGHT-INDUCED DEGRADATION; METHYL ORANGE; NANOSTRUCTURED THIN FILM; PHOTOCATALYTIC ACTIVITIES; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; RUTILE STRUCTURE; TIO; TITANIA THIN FILMS; X RAY DIFFRACTOMETERS;

ANNEALING; AZO DYES; CRYSTAL ATOMIC STRUCTURE; ENERGY GAP; MAGNETRON SPUTTERING; MERCURY (METAL); ORGANIC POLYMERS; OXIDE MINERALS; PHOTODEGRADATION; SOLIDS; SURFACE TOPOGRAPHY; THIN FILMS; TITANIUM DIOXIDE; VAPOR DEPOSITION; WAVELET TRANSFORMS; X RAY MICROSCOPES;

FILM PREPARATION;

EID: 77955512283     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.04.006     Document Type: Article

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