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Volumn 2, Issue 3, 2012, Pages

Bias-induced migration of ionized donors in amorphous oxide semiconductor thin-film transistors with full bottom-gate and partial top-gate structures

Author keywords

[No Author keywords available]

Indexed keywords

IONIZATION; OXIDE SEMICONDUCTORS; THIN FILM CIRCUITS; THIN FILMS;

EID: 84866341849     PISSN: None     EISSN: 21583226     Source Type: Journal    
DOI: 10.1063/1.4742853     Document Type: Article
Times cited : (12)

References (19)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.