Deposition, characterization and optimization of zinc oxide thin film for piezoelectric cantilevers

Applied Surface Science

Volumn 258, Issue 24, 2012, Pages 9510-9517

  Wang, Peihong ^a,b   Du, Hejun ^a   Shen, Shengnan ^a,c   Zhang, Mingsheng ^c   Liu, Bo ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b ANHUI UNIVERSITY   (China)

^c DATA STORAGE INSTITUTE   (Singapore)

Author keywords

Deposition condition; Optimization; Piezoelectric cantilever; RF magnetron sputtering; Transverse piezoelectric constant; Zinc oxide film

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION RATES; ENERGY DISPERSIVE SPECTROSCOPY; HARD DISK STORAGE; II-VI SEMICONDUCTORS; LASER DOPPLER VELOCIMETERS; MAGNETRON SPUTTERING; METALLIC FILMS; NANOCANTILEVERS; OPTICAL FILMS; OPTIMIZATION; OXIDE FILMS; PIEZOELECTRICITY; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; ZINC OXIDE;

ATOM FORCE MICROSCOPY (AFM); DEPOSITION CONDITIONS; ENERGY DISPERSIVE X RAY SPECTROSCOPY; PIEZOELECTRIC CANTILEVERS; PIEZOELECTRIC CONSTANT; PIEZOELECTRIC MICRO CANTILEVERS; RF MAGNETRON SPUTTERING METHOD; RF-MAGNETRON SPUTTERING;

THIN FILMS;

EID: 84864710366     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.04.158     Document Type: Article

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