SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 160-165

Structural and electrical characteristics of R.F. magnetron sputtered ZnO films

(6) Kang, D J a Kim, J S a Jeong, S W a Roh, Y a Jeong, S H a Boo, J H a

a Sungkyunkwan University (South Korea)

Author keywords

c axis orientation; FBAR; ZnO thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CAPACITORS; CHEMICAL VAPOR DEPOSITION; ELECTROCHEMISTRY; ELECTRODES; FILM GROWTH; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; METALLIC FILMS; MIM DEVICES; PERMITTIVITY; PIEZOELECTRICITY; RESONATORS; SOL-GELS; THIN FILMS; X RAY DIFFRACTION;

C-AXIS ORIENTATION; FILM BULK ACOUSTIC RESONATOR (FBAR); R.F. MAGNETRON SPUTTERING; ZNO THIN FILMS;

ZINC OXIDE;

EID: 13444254024 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2004.07.029 Document Type: Conference Paper

Times cited : (57)

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