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Applied Surface Science

Volumn 258, Issue 15, 2012, Pages 5689-5697

Fabrication and optical characterization of Si nanowires formed by catalytic chemical etching in Ag 2 O/HF solution

(2) Kato, Yuki a Adachi, Sadao a

a GUNMA UNIVERSITY (Japan)

Author keywords

Catalytic etching; Optical absorption; Si nanowire; Spectroscopic ellipsometry; Wettability

Indexed keywords

ABSORPTION SPECTROSCOPY; ETCHING; FABRICATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT ABSORPTION; NANOWIRES; OPTICAL DATA PROCESSING; SILVER OXIDES; SPECTROSCOPIC ELLIPSOMETRY; SURFACE ROUGHNESS; WETTING;

CATALYTIC ETCHING; OPTICAL ABSORBANCE; OPTICAL CHARACTERIZATION; OPTICAL MEASUREMENT; SI NANOWIRE; SYNTHESIS CONDITIONS; ULTRAVIOLET REGION; VERTICALLY ALIGNED;

SILICON WAFERS;

EID: 84863396938 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2012.02.063 Document Type: Article

Times cited : (18)

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