Porous silicon formation by photoetching in HF/H2O2 solution using incoherent light source

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 8 A, 2007, Pages 5021-5024

  Tomioka, Seigo ^a   Miyazaki, Takayuki ^a   Adachi, Sadao ^a  

^a GUNMA UNIVERSITY   (Japan)

Author keywords

Photoetching mechanism; Photoetching method; Photoluminescence; Porous silicon; SPM cleaning

Indexed keywords

ETCHING; PHOTOLUMINESCENCE; XENON;

LAMP ILLUMINATION; PHOTOETCHING MECHANISM; SPM CLEANING; SULPHURIC PEROXIDE MIXTURE (SPM) CLEANING; YELLOW PHOTOLUMINESCENCE;

POROUS SILICON;

EID: 34547858521     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.5021     Document Type: Article

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