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Volumn 99, Issue 15, 2011, Pages

Ultra high-density silicon nanowires for extremely low reflection in visible regime

Author keywords

[No Author keywords available]

Indexed keywords

CATALYTIC ETCHING; EFFECTIVE MEDIUM THEORIES; HIGH-DENSITY; INCIDENT LIGHT; SI SUBSTRATES; SILICON NANOWIRES; SPECTRAL RANGE; VERTICALLY ALIGNED;

EID: 80054982767     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3650266     Document Type: Article
Times cited : (43)

References (26)
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    • L. Hu and G. Chen, Nano Lett. 7, 3249 (2007). 10.1021/nl071018b
    • (2007) Nano Lett. , vol.7 , pp. 3249
    • Hu, L.1    Chen, G.2
  • 12
    • 77949437431 scopus 로고    scopus 로고
    • 10.1021/nl100161z
    • E. Garnett and P. D. Yang, Nano Lett. 10, 1082 (2010). 10.1021/nl100161z
    • (2010) Nano Lett. , vol.10 , pp. 1082
    • Garnett, E.1    Yang, P.D.2
  • 13
    • 69949135990 scopus 로고
    • 10.1364/AO.32.001154
    • D. H. Raguin and G. M. Morris, Appl. Opt. 32, 1154 (1993). 10.1364/AO.32.001154
    • (1993) Appl. Opt. , vol.32 , pp. 1154
    • Raguin, D.H.1    Morris, G.M.2
  • 19
    • 84967820816 scopus 로고
    • 10.1119/1.12734
    • D. E. Aspnes, Am. J. Phys. 50, 704 (1982). 10.1119/1.12734
    • (1982) Am. J. Phys. , vol.50 , pp. 704
    • Aspnes, D.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.