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Journal of the Electrochemical Society

Volumn 149, Issue 4, 2002, Pages

Characterization of Si(111) surfaces treated in NH4F and NH4HF2 solutions

(2) Tomita, Noriko a Adachi, Sadao a

a GUNMA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; CONTACT ANGLE; ELLIPSOMETRY; ETCHING; HYDROPHOBICITY; NITROGEN COMPOUNDS; OXIDES; SOLUTIONS; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

BULK DIELECTRIC FUNCTION; DEIONIZED WATER; ELLIPSOMETRIC WAVELENGTH; NATIVE OXIDE; SPATIAL WAVELENGTH; ULTRASONIC BATH;

SILICON WAFERS;

EID: 0036530381 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1455651 Document Type: Article

Times cited : (17)

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