Formation of a-Si:H and a-Si1-xCx :H nanowires by Ag-assisted electroless etching in aqueous HF/AgNO3 solution

Thin Solid Films

Volumn 519, Issue 16, 2011, Pages 5383-5387

  Douani, Rachida ^a   Piret, Gaëlle ^b   Hadjersi, Toufik ^c   Chazalviel, Jean Noël ^b   Solomon, Ionel ^b  

^a UNIVERSITÉ MOULOUD MAMMERI   (Algeria)

^b LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

^c L'Unite de Developpement de la Technologie du Silicium   (Algeria)

Author keywords

Amorphous alloys; Electroless chemical etching; Nanowires; Porous silicon; Scanning Electron Microscopy; Silicon; Silicon carbide

Indexed keywords

A-SI:H; AQUEOUS SOLUTIONS; CARBON CONCENTRATIONS; CHEMICAL VAPOUR DEPOSITION; DEPOSITED LAYER; ELECTROLESS; ELECTROLESS CHEMICAL ETCHING; ETCHING TIME; SILICON CARBON ALLOYS; SILVER NITRATES;

AMORPHOUS ALLOYS; AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; ETCHING; HYDROFLUORIC ACID; NANOWIRES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROUS SILICON; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON ALLOYS; SILICON CARBIDE; SILVER; SILVER ALLOYS;

AMORPHOUS SILICON;

EID: 79957998643     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.02.047     Document Type: Article

References (26)

1. R. Douani, K. Si-Larbi, T. Hadjersi, N. Megouda, and A. Manseri Phys. Status Solidi A 205 2008 225
2. K. Tsujino, and M. Matsumura Adv. Mater. 17 2005 1045
3. K. Peng, J. Hu, Y. Yan, Y. Wu, H. Fang, Y. Xu, S.T. Lee, and J. Zhu Adv. Funct. Mater. 16 2006 387
4. K. Peng, H. Fang, J. Hu, Y. Wu, J. Zhu, Y. Yan, and S.T. Lee Chem. Eur. J. 12 2006 7942
5. H.D. Um, J.Y. Jung, H.S. Seo, K.T. Park, S.W. Jee, S.A. Moiz, and J.H. Lee Jpn. J. Appl. Phys. 49 2010 04DN02
6. J. Zhu, Y. Zongfu, G.F. Burkhard, C.-M. Hsu, S.T. Connor, Y. Xu, Q. Wang, M. McGehee, S. Fan, and Y. Cui Nano Lett. 9 2009 279
7. K.Q. Peng, X. Wang, and S.T. Lee Appl. Phys. Lett. 95 2009 243112 1-3
8. A.I. Hochbaum, R. Chen, R.D. Delgado, W. Liang, E.C. Garnett, M. Najarian, A. Majumdar, and P. Yang Nature 451 2008 163
9. G. Piret, H. Drobecq, Y. Coffinier, O. Melnyk, and R. Boukherroub Langmuir 26 2010 1354
10. E. Galopin, G. Piret, S. Szunerits, Y. Lequette, C. Faille, and R. Boukherroub Langmuir 26 2010 3479
11. G. Piret, H. Drobecq, Y. Coffinier, O. Melnyk, and R. Boukherroub Langmuir 26 2010 1354
12. K.Q. Peng, Y.J. Yan, S.P. Gao, and J. Zhu Adv. Mater. 14 2002 1164
13. T. Qiu, X.L. Wu, G.G. Siu, and P.K. Chu J. Electron. Mater. 35 2006 1879
14. K.Q. Peng, Z.P. Huang, and J. Zhu Adv. Mater. 16 2004 73
15. S.L. Cheng, C.H. Chung, and H.C. Lee J. Electrochem. Soc. 155 2008 D711
16. N. Megouda, T. Hadjersi, G. Piret, R. Boukherroub, and O. Elkechai Appl. Surf. Sci. 255 2009 6210
17. M.L. Ahang, K.Q. Peng, X. Fan, J.S. Jie, R.Q. Zhang, S.T. Lee, and N.B. Wong J. Phys. Chem. C 112 2008 4444
18. N. Verplanck, E. Galopin, J.-C. Camart, V. Thomy, Y. Coffinier, and R. Boukherroub Nano Lett. 7 2007 813
19. K. Rerbal, F. Jomard, J.-N. Chazalviel, F. Ozanam, and I. Solomon Appl. Phys. Lett. 83 2003 45
20. I. Solomon, M.P. Schmidt, and H. Tran-Quoc Phys. Rev. B 38 1998 13263
21. T. Qiu, X.L. Wu, J.C. Shen, P.C.T. Ha, and P.K. Chu Nanotechnology 17 2006 5769
22. T. Qiu, X.L. Wu, Y.F. Mei, G.J. Wan, Paul K. Chu, and G.G. Siu J. Cryst. Growth 277 2005 143
23. K. Peng, A. Lu, R. Zhang, and S.-T. Lee Adv. Funct. Mater. 18 2008 3026
24. T.A. Witten Jr., and L.M. Sander Phys. Rev. Lett. 47 1981 1400
25. R. Douani, T. Hadjersi, R. Boukherroub, L. Adour, and A. Manseri Appl. Surf. Sci. 254 2008 7219
26. D.R. Lide CRC Handbook of Chemistry and Physics 75th ed 1995 CRC Press Boca Raton, Ann Arbor, London, Tokyo