Current stress induced electrical instability in transparent zinc tin oxide thin-film transistors

Journal of Nanoscience and Nanotechnology

Volumn 12, Issue 4, 2012, Pages 3421-3424

  Cheong, Woo Seok ^a   Shin, Jae Heon ^a   Chung, Sung Mook ^a   Hwang, Chi Sun ^a   Lee, Jeong Min ^a   Lee, Jong Ho ^b  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^b Seoul National University   (South Korea)

Author keywords

Electrical stability; Low frequency noise; Thin film transistor; Zn CSn COxide; ZTO

Indexed keywords

CONSTANT CURRENT STRESS; CURRENT NOISE; CURRENT STRESS; ELECTRICAL INSTABILITY; ELECTRICAL STABILITY; LOW-FREQUENCY NOISE; MOBILITY FLUCTUATIONS; RELATIVE INTENSITY; SHORT RANGE ORDERING; ZINC TIN OXIDE; ZN-CSN-COXIDE; ZTO;

SEMICONDUCTING ORGANIC COMPOUNDS; THIN FILM TRANSISTORS; TIN; TIN OXIDES;

ZINC;

EID: 84863305255     PISSN: 15334880     EISSN: 15334899     Source Type: Journal    
DOI: 10.1166/jnn.2012.5624     Document Type: Conference Paper

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