Enhanced electron field emission from plasma-nitrogenated carbon nanotips

Journal of Applied Physics

Volumn 111, Issue 4, 2012, Pages

  Wang, B B ^a,b   Cheng, Q J ^b,c   Zhong, X X ^d   Wang, Y Q ^e   Chen, Y A ^f   Ostrikov, K ^b,c  

^a CHONGQING UNIVERSITY OF TECHNOLOGY   (China)

^b CSIRO   (Australia)

^c UNIVERSITY OF SYDNEY   (Australia)

^d SHANGHAI JIAO TONG UNIVERSITY   (China)

^e BEIJING UNIVERSITY OF TECHNOLOGY   (China)

^f CHONGQING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED APPLICATIONS; ATOMIC FORCE MICROSCOPE (AFM); CARBON NANOTIPS; COMBINED EFFECT; ELECTRON FIELD EMISSION; ELECTRON FIELD EMITTER; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FLOWRATE RATIO; HIGH VACUUM; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; INTERMEDIATE FLOW; NITROGEN CONCENTRATIONS; NITROGEN GAS; NITROGEN INCORPORATION; PLASMA SPUTTERING;

ATOMIC FORCE MICROSCOPY; CARBON CLUSTERS; CHEMICAL VAPOR DEPOSITION; FIELD EMISSION; FIELD EMISSION MICROSCOPES; FLAT PANEL DISPLAYS; FLOW RATE; HYDROGEN; METHANE; NANOTIPS; NITROGEN; RAMAN SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

NITROGEN PLASMA;

EID: 84863229908     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3688252     Document Type: Article

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