Synthesis of carbon nitride powder by selective etching of TiC0.3N0.7 in chlorine-containing atmosphere at moderate temperature

Materials Chemistry and Physics

Volumn 123, Issue 1, 2010, Pages 264-268

  Sui, Jian ^a,b   Lu, Jin Jun ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Etching; Fourier transform infrared spectroscopy (FTIR); Nitride; X ray photo emission spectroscopy (XPS)

Indexed keywords

ACTIVE CARBON; AMBIENT PRESSURES; CHLORINATION TEMPERATURE; CRYSTALLINE STRUCTURE; FOURIER TRANSFORM INFRARED SPECTROSCOPY (FTIR); INORGANIC PRECURSOR; MASS LOSS; MODERATE TEMPERATURE; N CONTENT; SELECTIVE ETCHING; THERMAL ANALYSIS; THERMAL STABILITY; TRANSMISSION ELECTRON MICROSCOPE; X RAY PHOTOEMISSION SPECTROSCOPY; X-RAY DIFFRACTION DATA; XPS;

AMORPHOUS CARBON; ATMOSPHERIC TEMPERATURE; CHLORINATION; CHLORINE; EMISSION SPECTROSCOPY; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; RAMAN SPECTROSCOPY; SPECTRUM ANALYSIS; THERMOANALYSIS; THERMODYNAMIC STABILITY; TITANIUM; TITANIUM CARBIDE; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; WAVELET TRANSFORMS; X RAY DIFFRACTION; X RAY MICROSCOPES; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY POWDER DIFFRACTION; X RAYS;

CARBON NITRIDE;

EID: 77953134258     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2010.04.008     Document Type: Article

References (32)

1. Liu A.Y., and Cohen M.L. Science 245 (1989) 841
2. Cohen M.L. Phys. Rev. B 32 (1985) 7988
3. Lowther J.E. Phys. Rev. B 59 (1999) 11683
4. Teter D.M., and Hemley R.J. Science 271 (1996) 53
5. Alves I., Demazeau G., Tanguy B., and Weill F. Solid State Commun. 109 (1999) 697
6. Bousetta A., Lu M., Bensaoula A., and Schultz A. Appl. Phys. Lett. 65 (1994) 696
7. Fu Q., Jiu J.T., Cai K., Wang H., Cao C.B., and Zhu H.S. Phys. Rev. B 59 (1999) 1693
8. Miller D.R., Wang J.J., and Gillan E.G. Mater. Chem. 12 (2002) 2463
9. Lv Q., Cao C.B., Li C., Zhang J.T., Zhu H.S., Kong X., and Duan X.F. J. Mater. Chem. 13 (2003) 1241
10. Wang J.J., Miller D.R., and Gillan E.G. Chem. Commun. 19 (2002) 2258
11. Holst J.R., and Gillan E.G. J. Am. Chem. Soc. 130 (2008) 7373
12. Nguyen J.H., and Jeanloz R. Mater. Sci. Eng. A 209 (1996) 23
13. Nesting D.C., and Badding J.V. Chem. Mater. 8 (1996) 1535
14. Nikitin A., and Gogotsi Y. In: Nalwa H.S. (Ed). Encyclopedia of Nanoscience and Nanotechnology (2004), American Scientific Publisher, California pp. 1
15. Gogotsi Y., Jeon I.D., and McNallan M.J. J. Mater. Chem. 7 (1997) 1841
16. Gogotsi Y., Nikitin A., Ye H.H., Zhou W., Fischer J.E., Yi B., and Foley H.C. Nat. Mater. 2 (2003) 591
17. Gogotsi Y., Welz S., Ersoy D.A., and McNallan M.J. Nature 411 (2001) 283
18. Hoffman E.N., Yushin G., El-Raghy T., Gogotsi Y., and Barsoum M.W. Micropor. Mesopor. Mater. 112 (2008) 526
19. Pastor H. Mater. Sci. Eng. A 105-106 (1988) 401
20. Goglio G., Andrault D., Courjauli S., and Demazeau G. High Press. Res. 22 (2002) 535
21. Vinu A., Ariga K., Mori T., Nakanishi T., Hishita S., Golberg D., and Bando Y. Adv. Mater. 17 (2005) 1648
22. Gammon W.J., Kraft O., Reilly A.C., and Holloway B.C. Carbon 41 (2003) 1917
23. Yu Q., and Gao L. Chem. Commun. (2003) 2378
24. Cheng Y.H., Tay B.K., Lau S.P., Shi X., Qiao X.L., Chen J.G., Wu Y.P., Sun Z.H., and Xie C.S. J. Mater. Res. 17 (2002) 521
25. Hellgren N., Guo J.H., Luo Y., Sathe C., Agui A., Kashtanov S., Nordgren J., Agren H., and Sundgren J.E. Thin Solid Films 471 (2005) 19
26. Cao Y.G., Chen X.L., Lan Y.C., Li J.Y., Xu Y.P., and Xu T. Appl. Phys. A 71 (2000) 465
27. Wang J.J., Miller D.R., and Gillan E.G. Carbon 41 (2003) 2031
28. Feng P.X., Yang P., and Shi Y.C. J. Cryst. Growth 291 (2006) 22
29. Kovacs G.J., Veres M., Koos M., and Radnoczi G. Thin Solid Films 516 (2008) 7910
30. Kaufman J.H., Metin S., and Saperstein D.D. Phys. Rev. B 39 (1989) 13053
31. Kroke E., and Schwarz M. Coord. Chem. Rev. 248 (2004) 493
32. Miller D.R., Holst J.R., and Gillan E.G. Inorg. Chem. 46 (2007) 2767