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Volumn 56, Issue 5, 2010, Pages 1441-1445
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Inductively coupled plasma etching of chemical-vapor-deposited amorphous carbon in N2/H2/Ar chemistries
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Author keywords
Cvd a c; Inductively coupled plasma; Multi level resist; Plasma etching
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Indexed keywords
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EID: 77954851321
PISSN: 03744884
EISSN: None
Source Type: Journal
DOI: 10.3938/jkps.56.1441 Document Type: Article |
Times cited : (8)
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References (19)
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