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Volumn 56, Issue 5, 2010, Pages 1441-1445

Inductively coupled plasma etching of chemical-vapor-deposited amorphous carbon in N2/H2/Ar chemistries

Author keywords

Cvd a c; Inductively coupled plasma; Multi level resist; Plasma etching

Indexed keywords


EID: 77954851321     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.56.1441     Document Type: Article
Times cited : (8)

References (19)
  • 4
    • 0031220060 scopus 로고    scopus 로고
    • K. Popova, Vacuum 48, 681 (1997).
    • (1997) Vacuum , vol.48 , pp. 681
    • Popova, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.