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Volumn 37, Issue 1, 2011, Pages 167-178

Understanding the switching mechanism in RRAM devices and the dielectric breakdown of ultrathin high-k gate stacks from first principles calculations

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; CMOS INTEGRATED CIRCUITS; DEFECTS; ELECTRON TRANSPORT PROPERTIES; ELECTRONIC STRUCTURE; ENERGY GAP; HIGH-K DIELECTRIC; INTERFACE STATES; LOCAL DENSITY APPROXIMATION; LOGIC GATES; NICKEL OXIDE; OXIDE MINERALS; OXYGEN VACANCIES; RRAM; SEMICONDUCTOR DEVICE MANUFACTURE; THIN FILM TRANSISTORS; THIN FILMS; TITANIUM DIOXIDE; ULSI CIRCUITS;

EID: 84863144045     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3600737     Document Type: Conference Paper
Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.