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Volumn 37, Issue 1, 2011, Pages 167-178
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Understanding the switching mechanism in RRAM devices and the dielectric breakdown of ultrathin high-k gate stacks from first principles calculations
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Author keywords
[No Author keywords available]
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Indexed keywords
CALCULATIONS;
CMOS INTEGRATED CIRCUITS;
DEFECTS;
ELECTRON TRANSPORT PROPERTIES;
ELECTRONIC STRUCTURE;
ENERGY GAP;
HIGH-K DIELECTRIC;
INTERFACE STATES;
LOCAL DENSITY APPROXIMATION;
LOGIC GATES;
NICKEL OXIDE;
OXIDE MINERALS;
OXYGEN VACANCIES;
RRAM;
SEMICONDUCTOR DEVICE MANUFACTURE;
THIN FILM TRANSISTORS;
THIN FILMS;
TITANIUM DIOXIDE;
ULSI CIRCUITS;
ELECTRON TRANSPORT;
FIRST PRINCIPLES METHOD;
FIRST-PRINCIPLES CALCULATION;
FIRST-PRINCIPLES SIMULATIONS;
LOW OPERATING POWER;
NON-VOLATILE MEMORY TECHNOLOGY;
PHYSICAL PRINCIPLES;
SWITCHING MECHANISM;
THIN FILM CIRCUITS;
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EID: 84863144045
PISSN: 19385862
EISSN: 19386737
Source Type: Conference Proceeding
DOI: 10.1149/1.3600737 Document Type: Conference Paper |
Times cited : (6)
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References (59)
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