Stress-induced VO 2 films with M2 monoclinic phase stable at room temperature grown by inductively coupled plasma-assisted reactive sputtering

Journal of Applied Physics

Volumn 111, Issue 7, 2012, Pages

  Okimura, Kunio ^a   Watanabe, Tomo ^a   Sakai, Joe ^b  

^a TOKAI UNIVERSITY   (Japan)

^b UNIVERSITÉ DE TOURS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GRAINS; INDUCTIVELY-COUPLED; M1-PHASE; MONOCLINIC PHASE; MOTT TRANSITIONS; QUARTZ GLASS; REACTIVE SPUTTERING METHOD; RESISTANCE CHANGE; ROOM TEMPERATURE; SI SUBSTRATES; STRESS-INDUCED; STRONGLY CORRELATED MATERIALS; STRUCTURAL PHASE TRANSITION; TEMPERATURE RISE; TETRAGONAL PHASIS; TWIN STRUCTURE;

ATMOSPHERIC PRESSURE; CRYSTAL STRUCTURE; GROWTH (MATERIALS); INDUCTIVELY COUPLED PLASMA; QUARTZ; SCANNING ELECTRON MICROSCOPY;

FILMS;

EID: 84861733236     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3700210     Document Type: Conference Paper

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