Growth of VO2 films with metal-insulator transition on silicon substrates in inductively coupled plasma-assisted sputtering

Thin Solid Films

Volumn 515, Issue 12, 2007, Pages 4992-4995

  Okimura, Kunio ^a   Kubo, Naotaka ^a  

^a TOKAI UNIVERSITY   (Japan)

Author keywords

Inductively coupled plasma assisted sputtering; Metal insulator phase transition; Resistivity change; VO2 film

Indexed keywords

HYSTERESIS; INDUCTIVELY COUPLED PLASMA; PHASE TRANSITIONS; SPUTTERING; SUBSTRATES; VANADIUM COMPOUNDS;

INDUCTIVELY COUPLED PLASMA ASSISTED SPUTTERING (ICP); METAL INSULATOR PHASE TRANSITION (M-I); RESISTIVITY CHANGES;

FILM GROWTH;

EID: 33947161909     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.039     Document Type: Article

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