Effect of grain curvature on nano-indentation measurements of thin films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 9 A, 2004, Pages 6268-6273

  Tsai, Kuang Yue ^a   Chin, Tsung Shune ^a   Shieh, Han Ping D ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Grain curvature effect; Hardness of thin film; Nano indentation; Vanadium dioxide; VO 2; Young's modulus of thin film

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELASTIC MODULI; GRAIN SIZE AND SHAPE; HARDNESS; INDENTATION; MECHANICAL VARIABLES MEASUREMENT; SCANNING ELECTRON MICROSCOPY; STIFFNESS; THERMOCOUPLES; VANADIUM COMPOUNDS; X RAY DIFFRACTION;

GRAIN CURVATURE EFFECT; HARDNESS OF THIN FILMS; NANO-INDENTATION; VANADIUM DIOXIDE (VO2);

THIN FILMS;

EID: 9144231541     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.6268     Document Type: Article

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