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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 29, Issue 4, 2011, Pages

Substrate effects on metal-insulator transition characteristics of rf-sputtered epitaxial VO2 thin films

(2) Cui, Yanjie a Ramanathan, Shriram a

a HARVARD UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BULK SINGLE CRYSTALS; EPITAXIAL ORIENTATION RELATIONSHIP; LOW TEMPERATURES; MATERIAL SYSTEMS; METAL-TO-INSULATOR TRANSITIONS; ORDERS OF MAGNITUDE; OXIDATION ENVIRONMENT; POST DEPOSITION TREATMENT; RESISTANCE CHANGE; SINGLE CRYSTAL SUBSTRATES; SUBSTRATE EFFECTS; TIO;

ALUMINUM; DIFFRACTIVE OPTICS; EPITAXIAL FILMS; EPITAXIAL GROWTH; METAL INSULATOR BOUNDARIES; OZONE; SEMICONDUCTOR INSULATOR BOUNDARIES; SINGLE CRYSTALS; SUBSTRATES; TITANIUM DIOXIDE;

METAL INSULATOR TRANSITION;

EID: 79960491747 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3584817 Document Type: Article

Times cited : (63)

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