Characterization of mechanical properties of VO2 thin films on sapphire and silicon by ultra-microindentation

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 134-137

  Jin, P ^a   Nakao, S ^a   Tanemura, S ^b   Bell, T ^b   Wielunski, L S ^b   Swain, M V ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b CSIRO   (Australia)

Author keywords

Elastic properties; Epitaxy; Hardness; Sputtering; Vanadium oxide

Indexed keywords

ELASTIC MODULI; EPITAXIAL GROWTH; HARDNESS; POLYCRYSTALLINE MATERIALS; SAPPHIRE; SEMICONDUCTOR GROWTH; SPUTTERING; SUBSTRATES; THIN FILMS; VANADIUM COMPOUNDS;

EPITAXIAL FILMS; MEYER HARDNESS; POLYCRYSTALLINE FILMS; ULTRA-MICROINDENTATION;

SEMICONDUCTING FILMS;

EID: 0032673525     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01646-0     Document Type: Article

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