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Journal of Nanoscience and Nanotechnology

Volumn 12, Issue 2, 2012, Pages 1641-1644

The sub-micron hole array in sapphire produced by inductively-coupled plasma reactive ion etching

(8) Shiao, Ming Hua a Chang, Chun Ming a,b Huang, Su Wei c Lee, Chao Te a Wu, Tzung Chen a Hsueh, Wen Jeng b Ma, Kung Jeng c Chiang, Donyau a

a INSTRUMENT TECHNOLOGY RESEARCH CENTER (Taiwan)

b NATIONAL TAIWAN UNIVERSITY (Taiwan)

c CHUNG HUA UNIVERSITY (Taiwan)

Author keywords

Al 2O 3; ICP RIE; Polystyrene nanosphere; Sub micron hole array

Indexed keywords

BORON TRICHLORIDE; C-PLANE SAPPHIRE SUBSTRATES; CHROMIUM THIN FILMS; CONSTANT PRESSURES; ELECTRON BEAM EVAPORATION; GAS-FLOW RATIO; HOLE ARRAYS; ICP-RIE; MIXTURE GAS; NANOSPHERE LITHOGRAPHY; OXYGEN PLASMAS; SAPPHIRE SUBSTRATES; SELF-ASSEMBLED; SPIN-COATING METHOD; SUBMICRON;

BORON; CHROMIUM; ELECTROMAGNETIC INDUCTION; INDUCTIVELY COUPLED PLASMA; NANOSPHERES; OXYGEN; POLYSTYRENES; REACTIVE ION ETCHING; SAPPHIRE;

SUBSTRATES;

EID: 84861712016 PISSN: 15334880 EISSN: 15334899 Source Type: Journal
DOI: 10.1166/jnn.2012.4694 Document Type: Conference Paper

Times cited : (4)

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