SCOPUS 정보 검색 플랫폼

Optical Materials

Volumn 27, Issue 6, 2005, Pages 1171-1174

ICP etching of sapphire substrates

(7) Hsu, Y P a Chang, S J a Su, Y K a Sheu, J K b Kuo, C H a Chang, C S a Shei, S C c

a Inst Microlectron Dept Elec E (Taiwan)

b NATIONAL CENTRAL UNIVERSITY (Taiwan)

c South Epitaxy Corporation (Taiwan)

Author keywords

BCl3; Cl2 and CH 2Cl2; Patterned sapphire substrate; PSS

Indexed keywords

ANISOTROPY; BORON COMPOUNDS; CHLORINE; INDUCTIVELY COUPLED PLASMA; LIGHT EMITTING DIODES; MORPHOLOGY; PRESSURE EFFECTS; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING INDIUM COMPOUNDS; SUBSTRATES; SURFACES;

BCL3; CL2 AND CH2CL2; LATERAL EPITAXIAL PATTERNED SAPPHIRE (LEPS); PATTERNED SAPPHIRE SUBSTRATES (PSS);

PLASMA ETCHING;

EID: 14544303699 PISSN: 09253467 EISSN: None Source Type: Journal
DOI: 10.1016/j.optmat.2004.08.076 Document Type: Article

Times cited : (63)

References (12)

1
- 0028385147
- S. Nakamura, T. Mukai, and M. Senoh Appl. Phys. Lett. 64 1994 1687
- (1994) Appl. Phys. Lett. , vol.64 , pp. 1687
- Nakamura, S.¹ Mukai, T.² Senoh, M.³

2
- 0036661965
- S.J. Chang, C.H. Kuo, Y.K. Su, L.W. Wu, J.K. Sheu, T.C. Wen, W.C. Lai, J.F. Chen, and J.M. Tsai IEEE J. Sel. Top. Quan. Electron. 8 2002 744
- (2002) IEEE J. Sel. Top. Quan. Electron. , vol.8 , pp. 744
- Chang, S.J.¹ Kuo, C.H.² Su, Y.K.³ Wu, L.W.⁴ Sheu, J.K.⁵ Wen, T.C.⁶ Lai, W.C.⁷ Chen, J.F.⁸ Tsai, J.M.⁹

3
- 0031223973
- I. Akasaki, and H. Amano Jpn. J. Appl. Phys. 36 1997 5393
- (1997) Jpn. J. Appl. Phys. , vol.36 , pp. 5393
- Akasaki, I.¹ Amano, H.²

4
- 0036575575
- C.H. Kuo, S.J. Chang, Y.K. Su, J.F. Chen, L.W. Wu, J.K. Sheu, C.H. Chen, and G.C. Chi IEEE Electron. Dev. Lett. 23 2002 240
- (2002) IEEE Electron. Dev. Lett. , vol.23 , pp. 240
- Kuo, C.H.¹ Chang, S.J.² Su, Y.K.³ Chen, J.F.⁴ Wu, L.W.⁵ Sheu, J.K.⁶ Chen, C.H.⁷ Chi, G.C.⁸

5
- 0035364326
- W.C. Lai, S.J. Chang, M. Yokoyama, J.K. Sheu, and J.F. Chen IEEE Photon. Technol. Lett. 13 2001 559
- (2001) IEEE Photon. Technol. Lett. , vol.13 , pp. 559
- Lai, W.C.¹ Chang, S.J.² Yokoyama, M.³ Sheu, J.K.⁴ Chen, J.F.⁵

6
- 18744423003
- S.D. Lester, M.J. Ludowise, K.P. Killeen, B.H. Perez, J.N. Miller, and S.J. Rosner J. Cryst. Growth 189 1998 786
- (1998) J. Cryst. Growth , vol.189 , pp. 786
- Lester, S.D.¹ Ludowise, M.J.² Killeen, K.P.³ Perez, B.H.⁴ Miller, J.N.⁵ Rosner, S.J.⁶

7
- 0346308766
- H. Kudo, K. Murakami, R. Zheng, Y. Yamada, T. Taguchi, K. Tadatomo, H. Okagawa, Y. Ohuchi, T. Tsunekawa, Y. Imada, and K. Kata Jpn. J. Appl. Phys. 41 2002 2484
- (2002) Jpn. J. Appl. Phys. , vol.41 , pp. 2484
- Kudo, H.¹ Murakami, K.² Zheng, R.³ Yamada, Y.⁴ Taguchi, T.⁵ Tadatomo, K.⁶ Okagawa, H.⁷ Ohuchi, Y.⁸ Tsunekawa, T.⁹ Imada, Y.¹⁰ Kata, K.¹¹

8
- 0001223299
- I. Kidoguchi, A. lshibashi, G. Sugahara, and Y. Ban Appl. Phys. Lett. 76 2000 3768
- (2000) Appl. Phys. Lett. , vol.76 , pp. 3768
- Kidoguchi, I.¹ Lshibashi, A.² Sugahara, G.³ Ban, Y.⁴

9
- 0032114637
- T. Mukai, K. Takekawa, and S. Nakamura Jpn. J. Appl. Phys. 37 1998 L839
- (1998) Jpn. J. Appl. Phys. , vol.37
- Mukai, T.¹ Takekawa, K.² Nakamura, S.³

10
- 0036566171
- A.M. Rokowski, P.Q. Miraglia, E.A. Prele, S. Einfeldt, and R.F. Davis J. Cryst. Growth 241 2002 141
- (2002) J. Cryst. Growth , vol.241 , pp. 141
- Rokowski, A.M.¹ Miraglia, P.Q.² Prele, E.A.³ Einfeldt, S.⁴ Davis, R.F.⁵

11
- 0347220994
- K. Tadatomo, H. Okagawa, T. Tsunekawa, T. Jyouichi, Y. Imada, M. Kato, H. Kudo, and T. Taguchi Phys. Status Solidi A 188 2001 121
- (2001) Phys. Status Solidi A , vol.188 , pp. 121
- Tadatomo, K.¹ Okagawa, H.² Tsunekawa, T.³ Jyouichi, T.⁴ Imada, Y.⁵ Kato, M.⁶ Kudo, H.⁷ Taguchi, T.⁸

12
- 0038040507
- S.J. Chang, Y.C. Lin, Y.K. Su, C.S. Chang, T.C. Wen, S.C. Shei, J.C. Ke, C.W. Kuo, S.C. Chen, and C.H. Liu Solid State Electron. 47 2003 1539
- (2003) Solid State Electron. , vol.47 , pp. 1539
- Chang, S.J.¹ Lin, Y.C.² Su, Y.K.³ Chang, C.S.⁴ Wen, T.C.⁵ Shei, S.C.⁶ Ke, J.C.⁷ Kuo, C.W.⁸ Chen, S.C.⁹ Liu, C.H.¹⁰

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.