Refractive sapphire microlenses fabricated by chlorine–based inductively coupled plasma etching

Applied Optics

Volumn 40, Issue 22, 2001, Pages 3698-3702

  Park, Si Hyun ^a   Jeon, Heonsu ^a   Sung, Youn Joon ^b   Yeom, Geun Young ^b  

^a Seoul National University   (South Korea)

^b Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; ELECTROMAGNETIC WAVE DIFFRACTION; HARDNESS; INDUCTIVELY COUPLED PLASMA; PHOTORESISTS; PLASMA ETCHING; REFRACTION; SAPPHIRE;

PATTERN TRANSFER;

MICROLENSES;

EID: 0001257915     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.40.003698     Document Type: Article

References (11)

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