-
1
-
-
36849125984
-
-
10.1063/1.1702530
-
T. W. Hickmott, J. Appl. Phys. 33, 2669 (1962). 10.1063/1.1702530
-
(1962)
J. Appl. Phys.
, vol.33
, pp. 2669
-
-
Hickmott, T.W.1
-
2
-
-
0008076543
-
-
10.1063/1.1714372
-
T. W. Hickmott, J. Appl. Phys. 36, 1885 (1965). 10.1063/1.1714372
-
(1965)
J. Appl. Phys.
, vol.36
, pp. 1885
-
-
Hickmott, T.W.1
-
4
-
-
0043167636
-
-
10.1016/S0042-207X(76)81130-X
-
H. Biederman, Vacuum 26, 513 (1976). 10.1016/S0042-207X(76)81130-X
-
(1976)
Vacuum
, vol.26
, pp. 513
-
-
Biederman, H.1
-
5
-
-
0019674444
-
-
edited by A. K. Vijh (Marcel Dekker, New York), Vol. 6
-
D. P. Oxley, in Oxides and Oxide Films, edited by, A. K. Vijh, (Marcel Dekker, New York, 1981), Vol. 6, p. 251.
-
(1981)
Oxides and Oxide Films
, pp. 251
-
-
Oxley, D.P.1
-
8
-
-
77958609807
-
-
10.1088/0957-4484/21/41/412001
-
A. Chung, J. Deen, J.-S. Lee, and M. Meyyappan, Nanotechnology 21, 412001 (2009). 10.1088/0957-4484/21/41/412001
-
(2009)
Nanotechnology
, vol.21
, pp. 412001
-
-
Chung, A.1
Deen, J.2
Lee, J.-S.3
Meyyappan, M.4
-
9
-
-
78649340782
-
-
10.1109/JPROC.2010.2070830
-
H. Akinaga and H. Shima, Proc. IEEE 98, 2237 (2010). 10.1109/JPROC.2010. 2070830
-
(2010)
Proc. IEEE
, vol.98
, pp. 2237
-
-
Akinaga, H.1
Shima, H.2
-
10
-
-
79851501719
-
-
10.1080/00018732.2010.544961
-
Y. V. Pershin and M. DiVentra, Adv. Phys. 60, 145 (2011). 10.1080/00018732.2010.544961
-
(2011)
Adv. Phys.
, vol.60
, pp. 145
-
-
Pershin, Y.V.1
Diventra, M.2
-
13
-
-
0038336030
-
-
10.1063/1.1713823
-
T. W. Hickmott, J. Appl. Phys. 35, 2679 (1964). 10.1063/1.1713823
-
(1964)
J. Appl. Phys.
, vol.35
, pp. 2679
-
-
Hickmott, T.W.1
-
15
-
-
0000432842
-
-
10.1063/1.1287116
-
T. W. Hickmott, J. Appl. Phys. 88, 2805 (2000). 10.1063/1.1287116
-
(2000)
J. Appl. Phys.
, vol.88
, pp. 2805
-
-
Hickmott, T.W.1
-
18
-
-
33750509462
-
-
10.1063/1.2354325
-
T. W. Hickmott, J. Appl. Phys. 100, 083712 (2006). 10.1063/1.2354325
-
(2006)
J. Appl. Phys.
, vol.100
, pp. 083712
-
-
Hickmott, T.W.1
-
19
-
-
36149017207
-
-
10.1103/PhysRev.97.1538
-
A. Rose, Phys. Rev. 97, 1538 (1955). 10.1103/PhysRev.97.1538
-
(1955)
Phys. Rev.
, vol.97
, pp. 1538
-
-
Rose, A.1
-
22
-
-
3342959782
-
-
10.1016/0040-6090(72)90131-9
-
T. W. Hickmott, Thin Solid Films 9, 431 (1972). 10.1016/0040-6090(72) 90131-9
-
(1972)
Thin Solid Films
, vol.9
, pp. 431
-
-
Hickmott, T.W.1
-
23
-
-
0026204206
-
-
Y, 10.1016/0040-6090(91)90128-K
-
Y u. Yankelevitch, Y. Barengolz, and M. Khaskelberg, Thin Solid Films 203, 203 (1991). 10.1016/0040-6090(91)90128-K
-
(1991)
Thin Solid Films
, vol.203
, pp. 203
-
-
Yankelevitch, Yu.1
Barengolz, Y.2
Khaskelberg, M.3
-
25
-
-
77955402537
-
-
10.1016/j.tsf.2009.10.026
-
Y. Jo, H. Sim, H. Hwang, K. Ahn, and M.-H. Jung, Thin Solid Films 518, 5676 (2010). 10.1016/j.tsf.2009.10.026
-
(2010)
Thin Solid Films
, vol.518
, pp. 5676
-
-
Jo, Y.1
Sim, H.2
Hwang, H.3
Ahn, K.4
Jung, M.-H.5
-
26
-
-
79953012810
-
-
10.1063/1.3552980
-
K. Jung, Y. Kim, Y. S. Park, W. Jung, J. Choi, B. Park, H. Kim, W. Kim, J. Hong, and H. Im, J. Appl. Phys. 109, 054511 (2011). 10.1063/1.3552980
-
(2011)
J. Appl. Phys.
, vol.109
, pp. 054511
-
-
Jung, K.1
Kim, Y.2
Park, Y.S.3
Jung, W.4
Choi, J.5
Park, B.6
Kim, H.7
Kim, W.8
Hong, J.9
Im, H.10
-
28
-
-
73849125847
-
-
10.1063/1.3264621
-
J. Borghetti, D. B. Strukov, M. D. Pickett, J. J. Yang, D. R. Stewart, and R. S. Williams, J. Appl. Phys. 106, 124504 (2009). 10.1063/1.3264621
-
(2009)
J. Appl. Phys.
, vol.106
, pp. 124504
-
-
Borghetti, J.1
Strukov, D.B.2
Pickett, M.D.3
Yang, J.J.4
Stewart, D.R.5
Williams, R.S.6
-
29
-
-
33846984225
-
-
10.1063/1.2437668
-
K. Jung, H. Seo, Y. Kim, H. Im, and J. Hong, Appl. Phys. Lett. 90, 052104 (2007). 10.1063/1.2437668
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 052104
-
-
Jung, K.1
Seo, H.2
Kim, Y.3
Im, H.4
Hong, J.5
-
30
-
-
39349110003
-
-
10.1063/1.2837102
-
K. Jung, J. Choi, Y. Kim, H. Im, S. Seo, R. Jung, D. Kim, J.-S. Kim, B. H. Park, and J. P. Hong, J. Appl. Phys. 103, 034504 (2008). 10.1063/1.2837102
-
(2008)
J. Appl. Phys.
, vol.103
, pp. 034504
-
-
Jung, K.1
Choi, J.2
Kim, Y.3
Im, H.4
Seo, S.5
Jung, R.6
Kim, D.7
Kim, J.-S.8
Park, B.H.9
Hong, J.P.10
-
31
-
-
38149100067
-
-
10.1063/1.2829814
-
M. J. Lee, Y. Park, S. E. Ahn, B. S. Kang, C. B. Lee, K. H. Kim, W. X. Xianyu, I. K. Yoo, J. H. Lee, S. J. Chung, Y. H. Kim, C. S. Lee, K. H. Choi, and K. S. Chung, J. Appl. Phys. 103, 013706 (2011). 10.1063/1.2829814
-
(2011)
J. Appl. Phys.
, vol.103
, pp. 013706
-
-
Lee, M.J.1
Park, Y.2
Ahn, S.E.3
Kang, B.S.4
Lee, C.B.5
Kim, K.H.6
Xianyu, W.X.7
Yoo, I.K.8
Lee, J.H.9
Chung, S.J.10
Kim, Y.H.11
Lee, C.S.12
Choi, K.H.13
Chung, K.S.14
-
32
-
-
67649538428
-
-
10.1063/1.3139282
-
Ch. Walczyk, Ch. Wenger, R. Sohal, M. Lukosius, A. Fox, J. Dabrowski, D. Wolansky, B. Tillack, H.-J. Müssig, and T. Schroeder, J. Appl. Phys. 105, 114103 (2009). 10.1063/1.3139282
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 114103
-
-
Walczyk, Ch.1
Wenger, Ch.2
Sohal, R.3
Lukosius, M.4
Fox, A.5
Dabrowski, J.6
Wolansky, D.7
Tillack, B.8
Müssig, H.-J.9
Schroeder, T.10
-
33
-
-
34548406505
-
-
10.1063/1.2777170
-
T. Sakamoto, K. Lister, N. Banno, T. Hasegawa, K. Terabe, and M. Aono, Appl. Phys. Lett. 91, 092110 (2007). 10.1063/1.2777170
-
(2007)
Appl. Phys. Lett.
, vol.91
, pp. 092110
-
-
Sakamoto, T.1
Lister, K.2
Banno, N.3
Hasegawa, T.4
Terabe, K.5
Aono, M.6
-
34
-
-
57349143757
-
-
10.1063/1.3039079
-
W. Guan, M. Liu, S. Long, Q. Liu, and W. Wang, Appl. Phys. Lett. 93, 223506 (2008). 10.1063/1.3039079
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 223506
-
-
Guan, W.1
Liu, M.2
Long, S.3
Liu, Q.4
Wang, W.5
-
35
-
-
55449085689
-
-
10.1147/rd.524.0481
-
S. F. Karg, G. I. Meijer, J. G. Bednorz, C. T. Rettner, A. G. Schrott, E. A. Joseph, C. H. Lam, M. Janousch, U. Staub, F. La Mattina, S. F. Alvarado, D. Widmer, R. Stutz, U. Drechsler, and D. Caimi, IBM J. Res. Dev. 52, 481 (2008). 10.1147/rd.524.0481
-
(2008)
IBM J. Res. Dev.
, vol.52
, pp. 481
-
-
Karg, S.F.1
Meijer, G.I.2
Bednorz, J.G.3
Rettner, C.T.4
Schrott, A.G.5
Joseph, E.A.6
Lam, C.H.7
Janousch, M.8
Staub, U.9
La Mattina, F.10
Alvarado, S.F.11
Widmer, D.12
Stutz, R.13
Drechsler, U.14
Caimi, D.15
-
36
-
-
79251557831
-
-
10.1063/1.3543776
-
S. B. Lee, J. S. Lee, S. H. Chang, H. K. Yoo, B. S. Kang, B. Kahng, M.-J. Lee, C. J. Kim, and T. W. Noh, Appl. Phys. Lett. 98, 033502 (2011). 10.1063/1.3543776
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 033502
-
-
Lee, S.B.1
Lee, J.S.2
Chang, S.H.3
Yoo, H.K.4
Kang, B.S.5
Kahng, B.6
Lee, M.-J.7
Kim, C.J.8
Noh, T.W.9
-
37
-
-
33745725585
-
-
10.1063/1.2202121
-
J.-W. Park, K. Jung, M. K. Yang, J-K. Lee, D-Y. Kim, and J -W. Park, J. Appl. Phys. 99, 124102 (2006). 10.1063/1.2202121
-
(2006)
J. Appl. Phys.
, vol.99
, pp. 124102
-
-
Park, J.-W.1
Jung, K.2
Yang, M.K.3
Lee, J.-K.4
Kim, D.-Y.5
Park, J.-W.6
-
38
-
-
54149100188
-
-
10.1063/1.2931701
-
G. Garbarino, M. Nuez-Regueiro, M. Armand, and P. Lejay, Appl. Phys. Lett. 93, 152110 (2008). 10.1063/1.2931701
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 152110
-
-
Garbarino, G.1
Nuez-Regueiro, M.2
Armand, M.3
Lejay, P.4
-
39
-
-
79751505324
-
-
10.1002/pssa.201026757
-
Y. Koval, F. Chowdhury, X. Jin, Y. Simsek, F. Lichtenberg, R. Pentcheva, and P. Müller, Phys. Status Solidi A 208, 284 (2011). 10.1002/pssa. 201026757
-
(2011)
Phys. Status Solidi A
, vol.208
, pp. 284
-
-
Koval, Y.1
Chowdhury, F.2
Jin, X.3
Simsek, Y.4
Lichtenberg, F.5
Pentcheva, R.6
Müller, P.7
-
41
-
-
0027885918
-
-
10.1016/0927-796X(93)90005-N
-
M. M. Lohrengel, Mater. Sci. Eng. R 11, 243 (1993). 10.1016/0927-796X(93) 90005-N
-
(1993)
Mater. Sci. Eng. R
, vol.11
, pp. 243
-
-
Lohrengel, M.M.1
-
44
-
-
78649235730
-
-
10.1063/1.3504220
-
T. W. Hickmott, J. Appl. Phys. 108, 093703 (2010). 10.1063/1.3504220
-
(2010)
J. Appl. Phys.
, vol.108
, pp. 093703
-
-
Hickmott, T.W.1
-
45
-
-
36248931974
-
-
10.1063/1.2804104
-
T. W. Hickmott, J. Appl. Phys. 102, 093706 (2007). 10.1063/1.2804104
-
(2007)
J. Appl. Phys.
, vol.102
, pp. 093706
-
-
Hickmott, T.W.1
-
47
-
-
0001731655
-
-
10.1016/0022-3115(94)00529-X
-
B. D. Evans, J. Nucl. Mater. 219, 202 (1995). 10.1016/0022-3115(94)00529- X
-
(1995)
J. Nucl. Mater.
, vol.219
, pp. 202
-
-
Evans, B.D.1
-
48
-
-
78649312694
-
-
10.1063/1.3407510
-
T. W. Hickmott, J. Appl. Phys. 107, 093714 (2010). 10.1063/1.3407510
-
(2010)
J. Appl. Phys.
, vol.107
, pp. 093714
-
-
Hickmott, T.W.1
-
49
-
-
71749088955
-
-
10.1063/1.3262619
-
T. W. Hickmott, J. Appl. Phys. 106, 103719 (2009). 10.1063/1.3262619
-
(2009)
J. Appl. Phys.
, vol.106
, pp. 103719
-
-
Hickmott, T.W.1
-
50
-
-
0005336488
-
-
10.1063/1.1702801
-
T. W. Hickmott, J. Appl. Phys. 35, 2118 (1964). 10.1063/1.1702801
-
(1964)
J. Appl. Phys.
, vol.35
, pp. 2118
-
-
Hickmott, T.W.1
-
52
-
-
0032766479
-
-
S. W. S. McKeever, M. S. Akselrod, L. E. Colyott, N. A. Larsen, J. C. Polf, and V. Whitley, Radiat. Prot. Dosim. 84, 163 (1999).
-
(1999)
Radiat. Prot. Dosim.
, vol.84
, pp. 163
-
-
McKeever, S.W.S.1
Akselrod, M.S.2
Colyott, L.E.3
Larsen, N.A.4
Polf, J.C.5
Whitley, V.6
-
53
-
-
58149262891
-
-
10.1063/1.3050344
-
X. Yang, H-J. Li, Q-Y. Bi, Y. Cheng, Q. Tang, and J. Xu, J. Appl. Phys. 104, 123112 (2008). 10.1063/1.3050344
-
(2008)
J. Appl. Phys.
, vol.104
, pp. 123112
-
-
Yang, X.1
Li, H.-J.2
Bi, Q.-Y.3
Cheng, Y.4
Tang, Q.5
Xu, J.6
-
54
-
-
0041902796
-
-
10.1063/1.1708047
-
T. W. Hickmott, J. Appl. Phys. 37, 4380 (1966). 10.1063/1.1708047
-
(1966)
J. Appl. Phys.
, vol.37
, pp. 4380
-
-
Hickmott, T.W.1
-
55
-
-
0042904924
-
-
10.1016/0040-6090(69)90082-0
-
T. W. Hickmott, Thin Solid Films 3, 85 (1969). 10.1016/0040-6090(69) 90082-0
-
(1969)
Thin Solid Films
, vol.3
, pp. 85
-
-
Hickmott, T.W.1
-
57
-
-
77949760330
-
-
10.1063/1.3319591
-
H. Schroeder, V. V. Zhimov, R. K. Cavin, and R. Waser, J. Appl. Phys. 107, 054517 (2011). 10.1063/1.3319591
-
(2011)
J. Appl. Phys.
, vol.107
, pp. 054517
-
-
Schroeder, H.1
Zhimov, V.V.2
Cavin, R.K.3
Waser, R.4
|