Atomic force microscopy investigation of surface roughness generated between SiO 2 micro-pits in CHF 3/Ar plasma

Superlattices and Microstructures

Volumn 51, Issue 5, 2012, Pages 597-605

  Rad, Maryam Alsadat ^a   Ibrahim, Kamarulazizi ^a   Mohamed, Khairudin ^b  

^a SCHOOL OF PHYSICS   (Malaysia)

^b SCHOOL OF CHEMICAL ENGINEERING   (Malaysia)

Author keywords

Fluorocarbon; Micro pit; PMMA; Reactive ion etching; SiO 2; Surface roughness

Indexed keywords

ETCHING PROCESS; F/C RATIO; MASK LAYER; MASKING LAYERS; MICRO-PIT; PATTERN TRANSFERS; PMMA; POLYMER RESIST; POLYMERIZATION REACTION; PROCESS PRESSURE; RF-POWER; ROOT MEAN SQUARE ROUGHNESS; SELF-ORGANIZED NANOSTRUCTURES; SIO 2;

ATOMIC FORCE MICROSCOPY; CHEMICAL ANALYSIS; FLUOROCARBONS; PLASMA POLYMERIZATION; REACTIVE ION ETCHING; SILICA; TABLE LOOKUP;

SURFACE ROUGHNESS;

EID: 84859329887     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2012.03.002     Document Type: Article

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