Fabrication of high quality two-dimensional photonic crystal mask layer patterns

Optical and Quantum Electronics

Volumn 41, Issue 3, 2009, Pages 151-158

  Peng, Yin Sheng ^a   Xu, Bo ^a   Ye, Xiao Ling ^a   Niu, Jie Bin ^b   Jia, Rui ^b   Wang, Zhan Guo ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Electron beam lithography; Mask layers; Photonic crystal; Reaction ion etching

Indexed keywords

ELECTRON BEAM EXPOSURE DOSE; ETCHING METHOD; HIGH QUALITY; MASK LAYER; MASK LAYERS; REACTION ION ETCHING; TWO-DIMENSIONAL PHOTONIC CRYSTALS;

ELECTRON BEAMS; ELECTRONS; ETCHING; IONS; PHOTONIC CRYSTALS; SILICON COMPOUNDS; TWO DIMENSIONAL;

ELECTRON BEAM LITHOGRAPHY;

EID: 72449159108     PISSN: 03068919     EISSN: 1572817X     Source Type: Journal    
DOI: 10.1007/s11082-009-9336-8     Document Type: Article

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