Nanofabrication of sharp diamond tips by e-beam lithography and inductively coupled plasma reactive ion etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 3125-3131

  Moldovan, Nicolaie ^a   Divan, Ralu ^b   Zeng, Hongjun ^a   Carlisle, John A ^a  

^a ADVANCED DIAMOND TECHNOLOGIES INC   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIAMOND COATING; DIAMOND TIP; E-BEAM LITHOGRAPHY; ETCH RATES; EXISTING METHOD; FIELD EMITTER; FOCUSED ION BEAM MILLING; HIGH ASPECT RATIO; INDUCTIVELY COUPLED-PLASMA REACTIVE ION ETCHING; LOW FRICTION COEFFICIENTS; LOW WORK FUNCTION; NANO SCALE; NANOFABRICATION; OPTIMIZED ETCHING; REACTIVE ION; RELEASE PROCESS; SACRIFICIAL SUBSTRATES; SHARP TIP; SILICON TIPS; STRUCTURAL MATERIALS; TIP RADIUS; ULTRA-NANOCRYSTALLINE DIAMOND;

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; BUILDING MATERIALS; COATINGS; DIAMOND CUTTING TOOLS; DIAMONDS; DISSOLUTION; FRICTION; GLUING; INDUCTIVELY COUPLED PLASMA; IONS; MOLDING; NANOCRYSTALLINE MATERIALS; PHOTORESISTS; REACTIVE ION ETCHING; SUBSTRATES;

DIAMOND FILMS;

EID: 72849150028     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3263174     Document Type: Conference Paper

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