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Diamond and Related Materials

Volumn 20, Issue 5-6, 2011, Pages 707-710

A direct-write, resistless hard mask for rapid nanoscale patterning of diamond

(3) McKenzie, Warren a Pethica, John a Cross, Graham a

a TRINITY COLLEGE DUBLIN (Ireland)

Author keywords

Diamond; Dry etching; Focused ion beam; Hard mask; Lithography; Nanoindentation; Plasma etching

Indexed keywords

ARGON PLASMAS; DEPOSITED FILMS; DIAMOND COATING; DIAMOND PROPERTY; DIAMOND SURFACES; DIRECT WRITE; DRY-ETCH; HARD MASKS; HIGH RESOLUTION; ION BEAM EXPOSURE; ION MILLING; MATERIAL REMOVAL; NANOINDENTER TIP; NANOSCALE PATTERNING; NON-PLANAR SURFACES; OXYGEN PLASMAS; PATTERN TRANSFERS; POTENTIAL APPLICATIONS; RESISTLESS TECHNIQUE; SILICON SURFACES; TOP SURFACE;

ARGON; DIAMONDS; ION BEAMS; IONS; LITHOGRAPHY; NANOINDENTATION; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; OXYGEN; PLASMA ETCHING; PLASMAS; SILICON ON INSULATOR TECHNOLOGY; SURFACES;

DRY ETCHING;

EID: 79956071008 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/j.diamond.2011.03.008 Document Type: Article

Times cited : (16)

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