Metal-doped ZnO thin films: Synthesis, etching characteristic, and application test for organic light emitting diode (OLED) devices

Surface Review and Letters

Volumn 17, Issue 1, 2010, Pages 121-127

  Nam, Sang Hun ^a   Kim, Myoung Hwa ^a   Yoo, Dong Geun ^a   Jeong, Seong Hun ^a   Kim, Doo Yong ^a   Lee, Nae Eung ^a   Boo, J H ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Etching; Metal doped ZnO thin films; Optical and electrical property; Organic light emitting diode

Indexed keywords

ELECTRICAL RESISTIVITY; ETCHANT CONCENTRATIONS; ETCHING CHARACTERISTICS; ETCHING RATE; HIGH RESISTIVITY; METAL CONTENT; METAL-DOPED; OPTICAL AND ELECTRICAL PROPERTIES; OPTICAL AND ELECTRICAL PROPERTY; PH VALUE; PURE ZNO; RF-MAGNETRON SPUTTERING; ZNO;

DIODES; DOPING (ADDITIVES); DRY ETCHING; ELECTRIC CONDUCTIVITY; EPITAXIAL FILMS; LIGHT EMISSION; LIGHT EMITTING DIODES; MAGNETRON SPUTTERING; METALLIC FILMS; METALS; OPTICAL PROPERTIES; ORGANIC LIGHT EMITTING DIODES (OLED); PHYSICAL OPTICS; PLASMA ETCHING; SILVER; VAPOR DEPOSITION; ZINC OXIDE;

OPTICAL FILMS;

EID: 77953487871     PISSN: 0218625X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0218625X10014065     Document Type: Conference Paper

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